Integrated low K dielectrics and etch stops

ABSTRACT

A method of depositing and etching dielectric layers having low dielectric constants and etch rates that vary by at least 3:1 for formation of horizontal interconnects. The amount of carbon or hydrogen in the dielectric layer is varied by changes in deposition conditions to provide low k dielectric layers that can replace etch stop layers or conventional dielectric layers in damascene applications. A dual damascene structure having two or more dielectric layers with dielectric constants lower than about 4 can be deposited in a single reactor and then etched to form vertical and horizontal interconnects by varying the concentration of a carbon:oxygen gas such as carbon monoxide. The etch gases for forming vertical interconnects preferably comprises CO and a fluorocarbon, and CO is preferably excluded from etch gases for forming horizontal interconnects.

RELATED APPLICATIONS

This application is a continuation-in-part of co-pending U.S. Pat.application Ser. No. 09/021,788 now U.S. Pat. No. 6,054,379 [AMAT/2592],which was filed on Feb. 11, 1998; a continuation-in-part of co-pendingU.S. patent application Ser. No. 09/162,915 [AMAT/3032], which was filedon Sep. 29, 1998; and a continuation-in-part of co-pending U.S. patentapplication Ser. No. 09/189,555 [AMAT/3032.P1], which was filed on Nov.11, 1998 ABN.

BACKGROUND OF THE DISCLOSURE

1. Field of the Invention

The present invention relates to the fabrication of integrated circuits.More particularly, the invention relates to a process and apparatus fordepositing and etching dielectric layers on a substrate.

2. Background of the Invention

Semiconductor device geometries have dramatically decreased in sizesince such devices were first introduced several decades ago. Sincethen, integrated circuits have generally followed the two year/half-sizerule (often called Moore's Law), which means that the number of deviceson a chip doubles every two years. Today's fabrication plants areroutinely producing devices having 0.35 μm and even 0.18 μm featuresizes, and tomorrow's plants soon will be producing devices having evensmaller geometries.

In order to further reduce the size of devices on integrated circuits,it has become necessary to use conductive materials having lowresistivity and insulators having low dielectric constants (k≦4.0) toreduce the capacitive coupling between adjacent metal lines. Aconductive material of interest is copper which can be deposited insubmicron features by electrochemical deposition. Dielectric materialsof interest are silicon oxides that contain carbon. Combination ofsilicon oxide materials and copper has led to new deposition methods forpreparing vertical and horizontal interconnects since copper is noteasily etched to form metal lines. Such methods include damascene ordual damascene methods depositing vertical and horizontal interconnectswherein one or more dielectric materials are deposited and etched toform the vertical and horizontal interconnects that are filled with theconductive material.

Dielectric layers can be deposited, etched and filled with metal inmultiple steps that typically require frequent transfers of substratesbetween processing chambers dedicated to specific steps. Preferredmethods for depositing dielectric layers include two predominant dualdamascene methods where lines/trenches are filled concurrently withvias/contacts. In a “counter-bore” scheme, a series of dielectric layersare deposited on a substrate as described in more detail for variousembodiments of the present invention. Then vertical interconnects suchas vias/contacts are etched through all of the layers and horizontalinterconnects such as lines/trenches are etched through the top layers.In the alternative, the lines/trenches are etched in the top layers andthen the vias/contacts are etched through the bottom layers. Aconductive material is then deposited in both the vertical andhorizontal interconnects.

The other predominate scheme for creating a dual damascene structure isknown as a “self-aligning contact” (SAC) scheme. The SAC scheme issimilar to the counter-bore scheme, except that an etch stop layer isdeposited on a bottom dielectric layer and etched to define thevias/contacts before another dielectric layer is deposited on top of theetch stop layer. The vertical and horizontal interconnects are thenetched in a single step, and conductive material is then deposited inboth the vertical and horizontal interconnects.

The counter-bore scheme does not require an etch stop layer between thedielectric layers if the upper dielectric layer can be etched usingconditions that provide an etch rate for the upper layer that is atleast about three times greater than the corresponding etch rate for thelower layer (i.e., an etch selectivity of at least about 3:1). However,the selectivity of etch processes for conventional low k dielectriclayers is typically less than 3:1, and etch stop layers that provide thedesired etch selectivity are routinely used between adjacent low kdielectric layers. The etch stop layers provide uniformity in the depthof horizontal interconnects across the surface of the substrate. Theetch stop layers farther reduce micro-trenching such that the bottom ofhorizontal interconnects are flat instead of deeper at outside edges.The etch stop layers further reduce faceting or fencing of previouslyetched vertical interconnects during etching of horizontalinterconnects, wherein the edge between the bottom of the horizontalinterconnects and the side walls of the vertical interconnects are sharpinstead of either rounded (i.e., faceted) or raised (i.e., fenced)depending on whether the side walls of the vertical interconnects areexposed to etch gases or shielded from etch gases.

Conventional etch stop layers provide the benefits just described fordamascene applications, but typically have dielectric constants that aresubstantially greater than 4. For example, silicon nitride has adielectric constant of about 7, and deposition of such an etch stoplayer on a low k dielectric layer results in a substantially increaseddielectric constant for the combined layers. It has also been discoveredthat silicon nitride may significantly increase the capacitive couplingbetween interconnect lines, even when an otherwise low k dielectricmaterial is used as the primary insulator. This may lead to crosstalkand/or resistance-capacitance (RC) delay that degrades the overallperformance of the device.

Ideally, low k dielectric layers would be identified and etch processeswould be defined wherein an etch selectivity for the dielectric layersis at least about 3:1 for use in selective etch processes such as dualdamascene processes. Preferably, the low k dielectric layers thatprovide the desired etch selectivity could be deposited in the samechamber.

SUMMARY OF THE INVENTION

The present invention provides a method for etching one or moredielectric layers having a dielectric constant less than or equal toabout 4.0 (low k), wherein differences in dielectric compositionsprovides an etch selectivity of at least 3:1. The invention includesetching of dielectric layers containing silicon, oxygen, carbon, andhydrogen wherein differences in composition provide an etch selectivitygreater than 3:1 in the absence of a carbon:oxygen gas, such as carbonmonoxide. Addition of carbon:oxygen gases to one or more fluorocarbongases provides fast etch rates at lower etch selectivity which can beused when high selectivity is not needed. At least one of the dielectriclayers preferably has high carbon content (greater than about 1% byatomic weight) or high hydrogen content (greater than about 0.1% byatomic weight). The carbon:oxygen gas is reduced or omitted from etchgases when a selective etching of adjacent dielectric layers is desired,such as when forming horizontal interconnects.

The present invention further provides an integrated method fordepositing and etching adjacent low k dielectric materials with reducedtransfers of a substrate between chambers, and with an etch selectivitybetween adjacent dielectric layers of at least 3:1. The high etchselectivity provides horizontal interconnects having uniform depths andsubstantially square corners without conventional etch stop layers. Atleast one dielectric layer contains silicon, oxygen, carbon, andhydrogen. Additional dielectric layers can be any dielectric layerhaving a dielectric constant less than about 4.0, such as produced byspin on deposition methods or by chemical vapor deposition methods. Alldielectric layers are preferably produced by chemical vapor depositionof one or more organosilicon compounds using power levels, flow rates,and composition changes to control etch selectivity by controlling thesilicon, oxygen, carbon, and hydrogen content of the depositedmaterials.

In a first preferred dual damascene embodiment, a first low k dielectriclayer and a second low k dielectric layer are deposited on a substrateby oxidation of one or more organosilicon compounds, such asmethylsilane, CH₃SiH₃, or trimethylsiloxane, (CH₃)₃—Si—O—Si—(CH₃)₃, forsubsequent etching of vertical and horizontal interconnects. The firstdielectric layer is an etch stop layer that contains silicon, oxygen,carbon, and hydrogen, preferably at least about 5% carbon by atomicweight and at least about 1% hydrogen by atomic weight. The seconddielectric layer preferably contain less than two-thirds of the carbonor less than one-fifth of the hydrogen contained in the first dielectriclayer, more preferably less than one-half of the carbon or less thanone-tenth of the hydrogen. The vertical and horizontal interconnects arethen etched into the low k dielectric layers using fluorocarbon gases. Acarbon:oxygen compound, such as carbon monoxide, is added to thefluorocarbon gases during etching of vertical interconnects, and is notused during etching of horizontal interconnects to obtain an etchselectivity of at least 3:1. The horizontal and vertical interconnectscan then be filled with a conductive material such as copper.

In a second preferred dual damascene embodiment, a first low kdielectric layer, a second low k dielectric layer, and a third low kdielectric layer are deposited on a substrate by oxidation of one ormore organosilicon compounds, such as methylsilane, CH₃SiH₃, ortrimethylsiloxane, (CH₃)₃—Si—O—Si—(CH₃)₃, for subsequent etching ofvertical and horizontal interconnects. The second dielectric layer is anetch stop layer and contains silicon, oxygen, carbon, and hydrogen,preferably at least about 5% carbon by atomic weight and at least about1% hydrogen by atomic weight. The first and third dielectric layerspreferably contain less than two-thirds of the carbon and less thanone-fifth of the hydrogen contained in the second dielectric layer, morepreferably less than one-half of the carbon and less than one-tenth ofthe hydrogen. The vertical and horizontal interconnects are then etchedinto the low k dielectric layers using fluorocarbon gases. Acarbon:oxygen compound, such as carbon monoxide, is added to thefluorocarbon gases during etching of vertical interconnects, andpreferably is not used during etching of horizontal interconnects toobtain an etch selectivity of at least 3:1. The horizontal and verticalinterconnects can then be filled with a conductive material such ascopper.

BRIEF DESCRIPTION OF THE DRAWINGS

So that the manner in which the above recited features, advantages andobjects of the present invention are attained and can be understood indetail, a more particular description of the invention, brieflysummarized above, may be had by reference to the embodiments thereofwhich are illustrated in the appended drawings.

It is to be noted, however, that the appended drawings illustrate onlytypical embodiments of this invention and are therefore not to beconsidered limiting of its scope, for the invention may admit to otherequally effective embodiments.

FIGS. 1A-1H are cross sectional views showing a first embodiment of adual damascene deposition sequence of the present invention;

FIGS. 2A-2H are cross sectional views showing a second embodiment of adual damascene deposition sequence of the present invention;

FIG. 3 is a cross-sectional diagram of an exemplary CVD plasma reactorconfigured for use according to the present invention;

FIG. 4 show the relative amounts of carbon and hydrogen in four low kdielectric compositions that contain silicon, oxygen, carbon, andhydrogen; and

FIG. 5 is a schematic view in vertical cross-section of an etch processchamber suitable for practicing the etching process of the presentinvention.

For a further understanding of the present invention, reference shouldbe made to the ensuing detailed description.

DESCRIPTION OF PREFERRED EMBODIMENTS

The present invention provides a method for etching of low k dielectriclayers (i.e., k less than or equal to about 4, preferably less thanabout 3). The invention includes etching one or more dielectric layers,wherein differences in dielectric compositions provides an etchselectivity of at least 3:1. The method is ideally suited for selectiveetch processes such as damascene schemes that deposit conductivematerials, such as copper, within interconnects formed in the low kdielectric layers. In a preferred embodiment, the invention includescontrolling combination of a carbon:oxygen gas with fluorocarbon etchgases to control etch selectivity for low k dielectric layers thatcontain hydrogen and carbon. The invention further provides control overthe carbon and hydrogen content of adjacent dielectric layers to obtainlow dielectric constants and an etch selectivity of at least 3:1favoring one of the dielectric layers. Thus, the low k dielectric layersprovide sufficient etch selectivity to exclude conventional etch stopmaterials having high dielectric constants, such as silicon nitride,from deposition and etch processes such as damascene schemes. Dielectriclayers having low dielectric constants and low etch rates, in comparisonto other dielectric layers using the same etch conditions as describedherein, can replace or eliminate etch stop layers in many processes. Theintegrated deposition and etch methods of the invention also reducetransfers of a substrate between chambers by allowing all dielectriclayers to be deposited in a single chamber prior to etching.

The method of the invention provides an integrated dual damasceneprocess that includes depositing a first low k dielectric layer thatcontains silicon, carbon, oxygen, and hydrogen. A second low kdielectric layer deposited on the first low k dielectric layerpreferably contains less than two-thirds of the carbon or less thanone-fifth of the hydrogen contained in the first dielectric layer, morepreferably less than one-half of the carbon and less than one-tenth ofthe hydrogen. Both dielectric layers can be etched, e.g., with a mixtureof fluorocarbons and carbon:oxygen compounds such as carbon monoxide, toform vertical interconnects having steep sidewalls and sharp corners.The dielectric layer having the lower carbon or hydrogen content isselectively etched, such as by reducing or eliminating the flow ofcarbon:oxygen gas, to provide a selectivity of at least 3:1 favoring thedielectric layer having the lower carbon or hydrogen content.

A silicon oxide layer containing at least 1% by atomic weight of carbonor at least 0.1% by atomic weight of hydrogen is produced by spin onmethods, or by chemical vapor deposition of one or more organosiliconcompounds using power levels, flow rates, and composition changes tocontrol the carbon content and hydrogen content of the depositedmaterial. Low k dielectric layers having varying carbon or hydrogencontent can be deposited in a single chamber to provide all of thedielectric layers in the dual damascene method. The deposited dielectriclayers are then etched with gases that control passivating deposits onthe surfaces of etched features to provide an etch selectivity of atleast 3:1 between adjacent dielectric layers having dielectric constantsless than about 4, preferably less than about 3.

The present invention broadly includes etching of adjacent low kdielectric layers. The scope of the invention as claimed below is fullysupported by the description of the following preferred embodiments foretching or depositing dielectric layers that contain carbon or hydrogen.

A First Preferred Dual Damascene Process

A preferred dual damascene process shown in FIGS. 1A-1H includes etchingof two adjacent low k dielectric layers 10, 12 wherein the etchselectivity between the two layers is at least 3:1 when the etch gasescontain fluorocarbon gases and substantially no carbon:oxygen compounds.In other words, the adjacent low k dielectric layers have differentcompositions, and the second layer 12 has an etch rate that is at leastthree times greater than the etch rate of the first layer 10 when theetch gases include a fluorocarbon gas without substantial amounts of acarbon:oxygen gas. The first dielectric layer 10 functions as an etchstop layer during etching of the second dielectric layer 12. Addition ofcarbon:oxygen compounds such as carbon monoxide to the etch gases altersthe etch rates for the dielectric layers 10, 12 such that both layerscan be etched without substantial changes in the etch gas composition.

Referring to FIG. 1A, a first low k dielectric layer 10 containingsilicon, oxygen, carbon, and hydrogen, such as spin on low k dielectrics(doped) or a CVD layer deposited by oxidation of an organosiliconcompound containing C—H bonds and C—Si bonds, is deposited on a barrierlayer 14. The first low k dielectric layer 10 preferably contains atleast about 5% carbon by atomic weight or at least about 1% hydrogen byatomic weight. A second low k dielectric layer 12, such as spin on low kdielectrics (doped or undoped) or a CVD layer deposited by oxidation ofan organosilicon compound contains less than about two-thirds of thecarbon and less than about one-fifth of the hydrogen contained in thefirst dielectric layer 10, preferably less than one-half of the carbonand less than one-tenth of the hydrogen. The dielectric layers 10, 12are typically deposited on a barrier layer 14, such as silicon nitrideor silicon carbide, that protects the dielectric layers from diffusionof a conductive material 16 such as copper filling a feature in a priordielectric layer 18. The etch selectivity between the first dielectriclayer 10 and the barrier layer 14 is at least 2:1. A photoresist layer20 or a hard mask layer is deposited on the stack of dielectric layers10, 12 to transfer a pattern that is etched into the dielectric layers.The first dielectric layer 10 contains sufficient carbon or hydrogen tohave an etch rate that is at least three times lower than the etch ratefor the second dielectric layer 12 when etched with one or morefluorocarbon gases and substantially no carbon:oxygen gases.

Methods for depositing the first and second dielectric layers 10, 12 toobtain varying carbon and hydrogen contents is described in more detailbelow. Deposition of low k dielectric layers having low carbon content(less than about 1% by atomic weight) and low hydrogen content (lessthan about 0.1% by atomic weight) can also be performed usingconventional processes for depositing silicon oxides, such as byoxidation of tetraethylorthosilicate (TEOS), also known astetraethoxysilane.

The first dielectric layer 10 is preferably deposited to a thickness ofabout 5,000 to about 10,000 Å. The second dielectric layer 12 is thendeposited to a thickness of about 5,000 to about 10,000 Å. Thedielectric layers 10, 12 can be deposited in the same chamber using thesame reactants, such as methysilane or trimethylsiloxane, by varyingflow rates and or power levels as described in examples below. When thebarrier layer 14 is a silicon carbide layer, the barrier layer may alsobe deposited in the same chamber as the dielectric layers using the sameorganosilicon compound.

Although the first dielectric layer could be etched prior to depositionof the second dielectric layer, it is preferred to deposit bothdielectric layers prior to etching with gases that combine afluorocarbon gas and a carbon:oxygen gas.

Referring to FIG. 1B, the photoresist or hard mask 20 is patterned todefine horizontal interconnects 22 to be etched in the second dielectriclayer 12. As shown in an embodiment below, a pattern defining verticalinterconnects could be used first. A typical photoresist for siliconoxide layers is “RISTON,” manufactured by duPont de Nemours ChemicalCompany. The photoresist is exposed to UV light to define the patternand then portions of the photoresist are stripped away. A hard mask suchas a silicon oxide layer containing carbon or hydrogen could be usedbelow the photoresist and etched as described below after the pattern isdeveloped in the photoresist. The photoresist or hard mask then providesthe pattern that is transferred to the underlying layers.

Referring to FIG. 1C, the horizontal interconnects 22 are then etchedinto the second dielectric layer 12 using gases that combine one or morefluorocarbons without substantial amounts of carbon:oxygen gases.Etching of the dielectric layers to form horizontal interconnects ispreferably performed with a mixture of gases including argon and one ormore gases selected from CF₄, C₂F₆, and C₄F₈. The photoresist 20 orother material used to pattern the horizontal interconnects 22 is thenpreferably stripped using an oxygen/hydrogen ashing process, e.g., bycombination of oxygen and ammonia gases, or by another suitable process.

Referring to FIG. 1D, a second resist layer 24 or hard mask is depositedon the horizontal interconnects 22 and a planar surface is provided fortransfer of a pattern that defines vertical interconnects 26. Thephotoresist is exposed to UV light to define the pattern and thenportions of the photoresist are removed to define the verticalinterconnects 26. The photoresist 24 or hard mask provides the patternthat is transferred to the underlying layers during subsequent etching.If the vertical interconnects are etched first as described in the nextembodiment, then the second resist layer or hard mask would be used todefine the horizontal interconnects.

Referring to FIG. 1E, the first dielectric layer 10 and the barrierlayer 14 are then etched to complete the vertical interconnects 26 usinggases that combine one or more fluorocarbons and a carbon:oxygen gas.Etching of the dielectric layers to form vertical interconnects ispreferably performed with a mixture of gases including argon, CO, andone or more gases selected from CF₄, C₂F₆, and C₄F₈. Referring to FIG.1F, any photoresist or other material used to pattern the verticalinterconnects 26 is preferably stripped using an oxygen/hydrogen ashingprocess, e.g., by combination of oxygen and ammonia gases, or by anothersuitable process.

Referring to FIG. 1G, a suitable barrier layer 28 such as tantalumnitride is first deposited conformally in the horizontal and verticalinterconnects 22, 26 to prevent metal migration into the surroundingsilicon and/or dielectric materials. Referring to FIG. 1H, thehorizontal and vertical interconnects 22, 26 are then filled with aconductive material 30 such as aluminum, copper, tungsten orcombinations thereof. Presently, the trend is to use copper to form thesmaller features due to the low resistivity of copper (1.7 mW-cmcompared to 3.1 mW-cm for aluminum). Copper is deposited using eitherchemical vapor deposition, physical vapor deposition, electroplating, orcombinations thereof to form the conductive structure. Once thestructure has been filled with copper or other metal, the surface isplanarized using chemical mechanical polishing, as shown in FIG. 1H.

In an alternative embodiment, the first dielectric layer 10 in FIGS.1A-1H could be deposited on an initial silicon oxide layer (not shown),such as obtained by oxidation of TEOS, when the etch selectivity betweenthe first dielectric layer 10 and the barrier layer 14 is less than 2:1,such as when the barrier layer 14 is silicon nitride and the dielectriclayer contains more than 5% carbon by atomic weight or more than 1%hydrogen by atomic weight. The initial dielectric layer is selected tohave an etch selectivity of at least 2:1 with respect to the barrierlayer 14 so that the vertical interconnects 26 can be fully etchedbefore the barrier layer is totally removed from some of the verticalinterconnects. The initial oxide layer would preferably have a thicknessof from about 1,000 Å to about 3,000 Å to provide time for the verticalinterconnects to be completed to the barrier layer.

A Second Preferred Dual Damascene Process

Another preferred dual damascene process shown in FIGS. 2A-2H replaces aconventional etch stop layer with a low k dielectric layer thatfunctions as an etch stop layer 40 between two low k dielectric layers42, 44. The dielectric layers 42, 44 have an etch rate that is at leastthree times greater than the etch rate of the etch stop layer 40 whenthe etch gases contain fluorocarbon gases and substantially nocarbon:oxygen compounds. Preferably, the dielectric layers and the etchstop layer have similar compositions except that the etch stop layer hashigher amounts of carbon or hydrogen.

Referring to FIG. 2A, a first low k dielectric layer 42 and a third lowk dielectric layer 44 contain low amounts of carbon and hydrogen, suchas spin on low k dielectrics (doped or undoped) or a CVD layer depositedby oxidation of an organosilicon compound. A second low k dielectriclayer 40, the etch stop layer, contains relatively high amounts ofcarbon or hydrogen, such as spin on low k dielectrics (doped) or a CVDlayer deposited by oxidation of an organosilicon compound having C—Hbonds and C—Si bonds. The second low k dielectric layer 40 preferablycontains at least about 5% carbon by atomic weight or at least about 1%hydrogen by atomic weight. The first and third low k dielectric layers42, 44 contain less than two-thirds of the carbon or less than one-fifthof the hydrogen contained in the second dielectric layer 40, preferablyless than one-half of the carbon and less than one-tenth of thehydrogen. The dielectric layers 42, 40, 44 are typically deposited on abarrier layer 46, such as silicon nitride or silicon carbide, thatprotects a conductive material 48 such as copper filling a feature in alower dielectric layer 50. The etch selectivity of the first dielectriclayer 42 and the barrier layer 14 is at least 2:1.

A photoresist layer or a hard mask layer 52 is deposited on the stack ofdielectric layers 40, 42, 44 to transfer a pattern that is etched intothe dielectric layers. The etch stop layer 40 preferably containssufficient carbon or hydrogen to have an etch rate that is at leastthree times lower than the etch rate for the first and third dielectriclayers 42, 44 when the etch gases do not contain substantial amounts ofa carbon:oxygen gas. Deposition of the dielectric layers to have varyingcarbon and hydrogen contents is described in more detail below.

The first and third dielectric layers 42, 44 are preferably deposited toa thickness of about 5,000 to about 10,000 Å. The etch stop layer 40 ispreferably deposited to a thickness of about 500 to about 1,000 Å. Thefirst and third dielectric layers 42, 44 and the etch stop layer 40 canbe deposited in the same chamber using the same reactants by varyingflow rates and or power levels as described in examples below. When thebarrier layer 46 is a silicon carbide layer, the barrier layer may alsobe deposited in the same chamber as the dielectric layers.

Referring to FIG. 2B, the photoresist 52 hard mask is then patterned todefine vertical interconnects 54 to be etched in the first and third lowk dielectric layers 42, 44 and the etch stop layer 40. As shown in thefirst embodiment above, a pattern defining horizontal interconnectscould be used first. A typical photoresist for silicon oxide layers is“RISTON,” manufactured by duPont de Nemours Chemical Company. Thephotoresist is exposed to UV light to define the pattern and thenportions of the photoresist are stripped away. A hard mask such as asilicon oxide layer containing carbon or hydrogen could be used belowthe photoresist and etched as described below after the pattern isdeveloped in the photoresist. The photoresist or hard mask then providesthe pattern that is transferred to the underlying layers.

Referring to FIG. 2C, the vertical interconnects 54 are then etched intothe first and third low k dielectric layers 42, 44, the low k etch stoplayer 40, and the barrier layer 46 using gases that combinefluorocarbons and carbon:oxygen gases. Etching of the dielectric layersto form vertical interconnects is preferably performed with a mixture ofgases including argon, CO, and one or more gases selected from CF₄,C₂F₆, and C₄F₈. Any photoresist 52 or other material used to pattern thevertical interconnects 54 is preferably stripped using anoxygen/hydrogen ashing process, e.g., by combination of oxygen andammonia gases, or by another suitable process if necessary.

Referring to FIG. 2D, a second resist layer 55 or hard mask is depositedand then patterned to define the horizontal interconnects 56. Thephotoresist is exposed to UV light to define the pattern and thenportions of the photoresist are removed to define the horizontalinterconnects 56. If the horizontal interconnects were etched first, asecond resist layer or hard mask would be used to define the verticalinterconnects as previously described for the first embodiment. Thephotoresist could be left in the bottom of the vertical interconnects 54if desired to reduce etching of the underlying layer 48.

Referring to FIG. 2E, the third dielectric layer 44 is then etched tocomplete the horizontal interconnects 56 using gases that include one ormore fluorocarbons without substantial amounts of the carbon:oxygengases. Etching of the dielectric layers to form horizontal interconnects56 is preferably performed with a mixture of gases selected from argonand one or more gases selected from CF₄, C₂F₆, and C₄F₈, to provide aselectivity of at least 3:1 with respect to the etch stop layer 40. Thecarbon:oxygen gas is reduced omitted to provide a lower etch rate forthe etch stop layer 40. Referring to FIG. 2F, any photoresist or othermaterial used to pattern the horizontal interconnects 56 is strippedprior to filling the horizontal and vertical interconnects 56, 54. Thephotoresist is preferably stripped using an oxygen/hydrogen ashingprocess, e.g., by combination of oxygen and ammonia gases, or by anothersuitable process.

Referring to FIG. 2G, a suitable barrier layer 58 such as tantalumnitride is first deposited conformally in the horizontal and verticalinterconnects 56, 54 to prevent metal migration into the surroundingsilicon and/or dielectric materials. Referring to FIG. 2H, thehorizontal and vertical interconnects 56, 54 are then filled with aconductive material 60 such as aluminum, copper, tungsten orcombinations thereof as described for the first embodiment.

Depending on the selectivity of the etch processes, the horizontal orvertical interconnects can be etched after deposition of each dielectriclayer. In the alternative, the etch stop layer could be etched prior todeposition of the third dielectric layer. However, additional transfersof the substrate between chambers is required to alternate betweendeposition and etching of the dielectric layers.

In an alternative embodiment, the etch stop 40 in FIGS. 2A-2H could be asilicon nitride or silicon carbide layer deposited on a conventionaldielectric layer 42 having a dielectric constant greater than about 4.0.Thus, a low k dielectric layer 44 would enhance isolation of thehorizontal interconnects 56 while the conventional dielectric layer 42adequately isolates the vertical interconnects 54.

Deposition of Low k Dielectric Layers

The present invention provides a dielectric layer having a lowdielectric constant (k less than or equal to about 4.0) and having anetch rate at least 3 times lower than the etch rate for an adjacent lowk dielectric layer under etch conditions suitable for forming horizontalinterconnects in dielectric layers. Such low k dielectric layers can beproduced by spin on or CVD methods wherein silicon carbide layers orsilicon oxide layers containing carbon and hydrogen are formed. Low kdielectric layers having varying etch rates can be produced in the samechamber by varying amounts of the process gases as discussed in thefollowing description.

Preferred low k dielectric layers are produced by oxidation of anorganosilicon compound containing both C—H bonds and C—Si bonds, such asmethylsilane, CH₃SiH₃, dimethylsilane, (CH₃)₂SiH₂, trimethylsilane,(CH₃)₃SiH, 1,1,3,3-tetramethyldisiloxane, (CH₃)₂—SiH—O—SiH—(CH₃)₂, ortrimethylsiloxane, (CH₃)₃—Si—O—Si—(CH₃)₃. The silicon oxide layers arecured at low pressure and high temperature to stabilize properties. Thecarbon and hydrogen contents of the deposited dielectric layers iscontrolled by varying process conditions such as by changing to anotherorganosilicon compound, by oxidation with a variety of oxidizing gasessuch as oxygen, ozone, nitrous oxide, and water, by varying RF powerlevels during deposition, and by changing flow rates of process gases.

Carbon or hydrogen which remains in the silicon oxide or silicon carbidelayers contributes to low dielectric constants, good barrier properties,and reduced etch rates. The silicon oxide or silicon carbide layers areproduced from silicon compounds that include carbon within organicgroups that are not readily removed by oxidation at processingconditions. Preferably C—H bonds are included, such as in alkyl or arylgroups. Suitable organic groups also can include alkenyl andcyclohexenyl groups and functional derivatives. The organosiliconcompounds contain varying ratios of carbon to silicon and include:

methylsilane, CH₃—SiH₃ dimethylsilane, (CH₃)₂—SiH₂ trimethylsilane,(CH₃)₃—SiH tretramethylsilane, (CH₃)₄—Si dimethylsilanediol,(CH₃)₂—Si—(OH)₂ ethylsilane, CH₃—CH₂—SiH₃ phenylsilane, C₆H₅—SiH₃diphenylsilane, (C₆H₅)₂—SiH₂ diphenylsilanediol, (C₆H₅)₂—Si—(OH)₃methylphenylsilane, C₆H₅—SiH₂—CH₃ disilanomethane, SiH₃—CH₂—SiH₃bis(methylsilano)- CH₃—SiH₂—CH₂—SiH₂—CH₃ methane, 1,2-disilanoethane,SiH₃—CH₂—CH₂—SiH₃ 1,2-bis(methyl- CH₃—SiH₂—CH₂—CH₂—SiH₂—CH₃silano)ethane, 2,2-disilanopropane, SiH₃—C(CH₃)₂—SiH₃ 1,3,5-trisilano-SiH₂CH₂—)₃— (cyclic) 2,4,6-trimethylene, 1,3-dimethyl-CH₃—SiH₂—O—SiH₂—CH₃ disiloxane, 1,1,3,3-tetra- (CH₃)₂—SiH—O—SiH—(CH₃)₂methyldisiloxane, trimethylsiloxane, (CH₃)₃—Si—O—Si—(CH₃)₃1,3-bis(silano- (SiH₃—CH₂—SiH₂—)₂—O methylene)- disiloxane,bis(1-methyl- (CH₃—SiH₂—O—SiH₂—)₂—CH₂ disiloxanyl)- methane,2,2-bis(1-methyl- (CH₃—SiH₂—O—SiH₂—)₂—C(CH₃)₂ disiloxanyl)propane,2,4,6,8-tetramethyl- SiHCH₃—O—)₄— (cyclic) cyclotetrasiloxane,octamethylcyclo- Si(CH₃)₂—O—)₄— (cyclic) tetrasiloxane,2,4,6,8,10-penta- SiHCH₃—O—)₅— (cyclic) methylcyclo- pentasiloxane,1,3,5,7-tetra- SiH₂—CH₂—SiH₂—O—)₂— (cyclic) silano-2,6-dioxy-4,8-dimethylene, 2,4,6-trisilane- —SiH₂—CH₂—SiH₂—CH₂—SiH₂—O— (cyclic)tetrahydropyran, and 2,5-disilane- —SiH₂—CH₂—CH₂—SiH₂—O— (cyclic)tetrahydrofuran.

and derivatives thereof.

The organo silicon compounds are preferably oxidized during depositionby reaction with oxygen (O₂) or oxygen containing compounds such asnitrous oxide (N₂O), ozone (O₃), carbon dioxide (CO₂), and water (H₂O),preferably O₂ or N₂O, such that the carbon content of the depositedlayer is at least 1% by atomic weight and the hydrogen content of thedeposited layer is at least 0.1% by atomic weight. The oxidizedorganosilicon layer preferably has a dielectric constant of about 3.0 orless. The oxidized organosilicon layers provide low etch rates incomparison to the conventional silicon oxide compounds.

The organosilicon compounds can also be deposited as silicon carbidelayers by providing sufficient energy to dissociate the compounds. Thesilicon carbide layers may contain low amounts of oxygen to assist invarying etch rates for the deposited layers.

The hydrocarbon groups in the organosilanes and organosiloxane may bepartially fluorinated to convert C—H bonds to C—F bonds. Many of thepreferred organosilane and organosiloxane compounds are commerciallyavailable. A combination of two or more of the organosilanes ororganosiloxanes can be employed to provide a blend of desired propertiessuch as dielectric constant, oxide content, hydrophobicity, film stress,and plasma etching characteristics.

Oxygen and oxygen containing compounds are preferably dissociated toincrease reactivity when necessary to achieve a desired carbon contentin the deposited layer. RF power can be coupled to the depositionchamber to increase dissociation of the oxidizing compounds. Reducedamounts of oxygen or reduced dissociation of the oxygen results inhigher carbon contents, especially higher amounts of C—H or Si—CH₃ bondsin comparison to Si—O bonds. The oxidizing compounds may also bedissociated in a microwave chamber prior to entering the depositionchamber to reduce excessive dissociation of the silicon containingcompounds. Deposition of the silicon oxide layer can be continuous ordiscontinuous. Although deposition preferably occurs in a singledeposition chamber, the layer can be deposited sequentially in two ormore deposition chambers. Furthermore, RF power can be cycled or pulsedto reduce heating of the substrate and promote greater porosity in thedeposited layer. During deposition of the silicon oxide layer, thesubstrate is maintained at a temperature of from about −20° C. to about400° C., and preferably is maintained at a temperature of approximately−20° C. to 40° C.

The oxidized organosilicon compounds adhere to contacted surfaces suchas a patterned layer of a semiconductor substrate to form a depositedlayer. The deposited layers are cured at low pressure and attemperatures from about 100 to about 450° C., preferably above about400° C. to stabilize the barrier properties of the layers. The depositedlayer has sufficient hydrogen content to provide barrier properties. Thecarbon content preferably includes C—H or C—F bonds to provide ahydrophobic layer that is an excellent moisture barrier.

The method of the present invention employs a substrate processingsystem having a vessel including a reaction zone, a cathode pedestal forpositioning a substrate in the reaction zone, and a vacuum system. Theprocessing system further comprises a gas/liquid distribution systemconnecting the reaction zone of the vessel to supplies of anorganosilane or organosiloxane compound, an oxidizing gas, and an inertgas, and an RF generator coupled to the gas distribution system forgenerating a plasma in the reaction zone. The processing system furthercomprises a controller comprising a computer for controlling the vessel,the gas distribution system, and the RF generator, and a memory coupledto the controller, the memory comprising a computer usable mediumcomprising a computer readable program code for selecting the processsteps of depositing a low dielectric constant layer with a plasma of anorganosilane or organosiloxane compound and an oxidizing gas.

Etching of the deposited silicon oxide layers can be performed inconventional etch chambers such as described in U.S. Pat. No. 5,843,847,which description is incorporated by reference herein. A preferred etchchamber is the IPS chamber available from Applied Materials, Inc. ofSanta Clara, Calif. The '847 patent further describes etching ofdielectric layers, which description is also incorporated by referenceherein.

Further description of the invention relates to specific apparatus fordepositing and etching silicon oxide layers of the present invention andto preferred deposition and etch sequences for preparing dual damascenesilicon oxide layers.

Exemplary CVD Plasma Reactor and Process

One suitable CVD plasma reactor in which a method of the presentinvention can be carried out is shown in FIG. 3, which is a vertical,cross-section view of a parallel plate chemical vapor deposition reactor110 having a high vacuum region 115. Reactor 110 contains a gasdistribution manifold 111 for dispersing process gases throughperforated holes in the manifold to a substrate or wafer (not shown)that rests on a substrate support plate or susceptor 112 which is raisedor lowered by a lift motor 114. A liquid injection system (not shown),such as typically used for liquid injection of TEOS, may also beprovided for injecting a liquid organosilane and/or organosiloxanecompound. The preferred organosilanes are gases.

The reactor 110 includes heating of the process gases and substrate,such as by resistive heating coils (not shown) or external lamps (notshown). Referring to FIG. 3, susceptor 112 is mounted on a support stem113 so that susceptor 112 (and the wafer supported on the upper surfaceof susceptor 112) can be controllably moved between a lowerloading/off-loading position and an upper processing position which isclosely adjacent to manifold 111.

When susceptor 112 and the wafer are in processing position 114, theyare surrounded by a an insulator 117 and process gases exhaust into amanifold 124. During processing, gases inlet to manifold 111 areuniformly distributed radially across the surface of the wafer. A vacuumpump 132 having a throttle valve controls the exhaust rate of gases fromthe chamber.

Before reaching manifold 111, deposition and carrier gases are inputthrough gas lines 118 into a mixing system 119 where they are combinedand then sent to manifold 111. An optional microwave applicator 128 canbe located on the input gas line for the oxidizing gas to provideadditional energy that dissociates only the oxidizing gas. The microwaveapplicator provides from 0 to 6000 W. Generally, the process gasessupply line 118 for each of the process gases also includes (i) safetyshut-off valves (not shown) that can be used to automatically ormanually shut off the flow of process gas into the chamber, and (ii)mass flow controllers (also not shown) that measure the flow of gasthrough the gas supply lines. When toxic gases are used in the process,several safety shut-off valves are positioned on each gas supply line inconventional configurations.

The deposition process performed in reactor 110 can be either a thermalprocess or a plasma enhanced process. In a plasma process, a controlledplasma is typically formed adjacent to the wafer by RF energy applied todistribution manifold 111 from RF power supply 125 (with susceptor 112grounded). Alternatively, RF power can be provided to the susceptor 112or RF power can be provided to different components at differentfrequencies. RF power supply 125 can supply either single or mixedfrequency RF power to enhance the decomposition of reactive speciesintroduced into the high vacuum region 115. A mixed frequency RF powersupply typically supplies power at a high RF frequency (RF1) of 13.56MHz to the distribution manifold 111 and at a low RF frequency (RF2) of360 KHz to the susceptor 112. The silicon oxide layers of the presentinvention are most preferably produced using low levels of constant highfrequency RF power or pulsed levels of high frequency RF power. PulsedRF power preferably provides 13.56 MHz RF power at about 20 W to about500 W, most preferably from 20 W to about 250 W, during about 10% toabout 30% of the duty cycle. Constant RF power preferably provides 13.56MHz RF power at about 10 W to about 200 W, preferably from about 20 W toabout 100 W. Low power deposition preferably occurs at a temperaturerange from about −20° C. to about 40° C. At the preferred temperaturerange, the deposited layer is partially polymerized during depositionand polymerization is completed during subsequent curing of the layer.

For deposition of silicon carbide layers, the reaction occurs without asubstantial source of oxygen introduced into the reaction zone.Preferably, the 13.56 MHz RF power source applies about 300 to 700 wattswith a power density of about 4.3 to 10 watts/cm² to the anode andcathode to form the plasma in the chamber with the organosiliconcompound. The substrate surface temperature is maintained between about200° to 400° C., during the deposition of the SiC. For a more optimal,designated “most preferred,” process regime, trimethylsilane ormethylsilane flow rate is about 50 to 200 sccm, helium or argon flowrate to about 200 to 1000 sccm, the chamber pressure is from about 6 toabout 10 Torr, the RF power is from about 400 to about 600 watts with apower density of about 5.7 to 8.6 watts/cm², and the substrate surfacetemperature maintained between about 300° to 400° C.

Typically, any or all of the chamber lining, distribution manifold 111,susceptor 112, and various other reactor hardware is made out ofmaterial such as aluminum or anodized aluminum. An example of such a CVDreactor is described in U.S. Pat. No. 5,000,113, entitled A ThermalCVD/PECVD Reactor and Use for Thermal Chemical Vapor Deposition ofSilicon Dioxide and In-situ Multi-step Planarized Process, issued toWang et al. and assigned to Applied Materials, Inc., the assignee of thepresent invention.

The lift motor 114 raises and lowers susceptor 112 between a processingposition and a lower, wafer-loading position. The motor, the gas mixingsystem 119, and the RF power supply 125 are controlled by a systemcontroller 134 over control lines 136. The reactor includes analogassemblies, such as mass flow controllers (MFCs) and standard or pulsedRF generators, that are controlled by the system controller 134 whichexecutes system control software stored in a memory 138, which in thepreferred embodiment is a hard disk drive. Motors and optical sensorsare used to move and determine the position of movable mechanicalassemblies such as the throttle valve of the vacuum pump 132 and motorfor positioning the susceptor 112.

The above CVD system description is mainly for illustrative purposes,and other plasma CVD equipment such as electrode cyclotron resonance(ECR) plasma CVD devices, induction-coupled RF high density plasma CVDdevices, or the like may be employed. Additionally, variations of theabove described system such as variations in susceptor design, heaterdesign, location of RF power connections and others are possible. Forexample, the wafer could be supported and heated by a resistively heatedsusceptor. The pretreatment and method for forming a pretreated layer ofthe present invention is not limited to any specific apparatus or to anyspecific plasma excitation method.

The etch rate of low k dielectrics deposited in the processing chamberis controlled by adjusting the process gas flow rates and reactor powerlevels to deposit dielectric layers having desired carbon and hydrogencontents. The relative ratios of Si—CH₃, Si—H, or C—H bonds to thenumber of Si—O bonds for preferred dielectric layers A-D described inTable 1 are shown in FIG. 4. Based on atomic analysis of layer D, theestimated hydrogen and carbon contents of layers A-D are shown in Table1 as atomic weight percent. In FIG. 4, A-C represent methylsilane flowrates of 34 sccm and D is a flow rate of 68 sccm. A and D are at powerlevels of 80 W, B is a power level of 300 W, and C is a power level of20 W. The remaining conditions for depositing layers A-D are shown inTable 1. Table 1 and FIG. 4 demonstrate the variability in the hydrogenand carbon content based on changes in process conditions, which is anaspect of the present invention. The variation in carbon or hydrogencontent is then used to provide selective etching of the layer havinglower carbon content or lower hydrogen content as discussed in moredetail below.

TABLE 1 Process Conditions for Varying Carbon and Hydrogen ContentsRecipe A B C D Methysilane (sccm) 34 34 34 68 N₂O (sccm) 360 360 360 360He (sccm) 2000 2000 2000 2000 Power (W) 80 300 20 80 Spacing (mils) 320320 320 320 Pressure (torr) 3.0 3.0 3.0 3.0 Est. carbon, atomic wt % 8 59.5 10.5 Est. hydrogen, atomic wt % 5 0.3 2.5 3

Exemplary Etch Processes and Chamber

A preferred etch process for dielectric layers is described in U.S. Pat.No. 5,843,847, issued Dec. 1, 1998, which description is incorporated byreference herein. In the preferred process, etching of sidewalls invertical and horizontal interconnects is controlled by formation ofpassivating deposits that condense on the sidewalls and reduce etchingof the sidewalls. The etch gases include fluorocarbon gases andcarbon-oxygen gases combined in amounts that provide either highselectivity or low selectivity depending on the amount of thecarbon:oxygen gas. The etch compositions also provide low microloadingwhich is a measure of the difference in etch rate for large and smallsized features.

In order to provide highly selective etching and reduced microloadingfor silicon oxide layers that contain hydrogen and carbon, it wasdiscovered that the carbon:oxygen gases actually assisted in removingexcessive passivating compounds that built up on the surfaces of etchedfeatures from the carbon or the hydrogen released from the dielectriclayer. The excessive passivating layer on the surfaces of the etchedfeatures limits etching of the sidewalls when carbon:oxygen gases areincluded in the etch gases, and reduction of the passivating layersurprisingly occurs by lowering or stopping the flow of thecarbon:oxygen gas.

FIG. 5 illustrates an inductively coupled RF plasma etch chamber havinga single wafer processing chamber 140, such as for example, an IPS ETCHchamber, commercially available from Applied Materials Inc., SantaClara, Calif. The particular embodiment of the etch chamber shown hereinis provided only to illustrate the invention, and should not be used tolimit the scope of the invention. Other inductively coupled chambers canbe used to etch the dielectric layers, such as a Dielectric Etch MxP+chamber, also commercially available from Applied Materials. Thedielectric layers can also be etched in parallel plate plasma chambers.

The etch chamber shown in FIG. 5 is typically evacuated to a pressure ofless than about 150 mTorr, and a substrate is transferred to theprocessing chamber 140. A plasma is generated in the processing chamberby dual solenoid coils 142, 190 having windings 144, 192 that areconcentrated in a non-planar fashion around an axis of symmetry 146 thatcoincides with the center of the processing chamber 140. Other coilconfigurations, such as an optional coil 194, would be evident topersons skilled in the art.

The processing chamber 140 is surrounded by a cylindrical side wall 150and a ceiling 152. A pedestal 154 at the bottom of the processing region140 supports the substrate 156. The processing chamber 140 is evacuatedthrough an annular passage 158 to a pumping annulus 160 surrounding thelower portion of the processing chamber 140. The interior of the annulus160 is preferably lined with a replaceable liner 160A. The annularpassage 158 is defined by the bottom edge 150A of the side wall 150 anda disposable ring 162 that surrounds the pedestal 154. Process gas isprovided through one or more gas feeds 164A-C.

The central solenoid coil 142 is wound around a housing 166 surroundinga center radiant heater 172. A first plasma source RF power supply 168is connected to the inner coil 142 and a second power supply 196 isconnected to the outer coil 190. In the alternative, a single powersupply 197A could be connected to both coils using a splitter 196. Abias power supply 170 is connected to the pedestal 154. Additionalradiant heaters 172 such as halogen lamps are mounted in unoccupiedregions of the ceiling and a cooling plate 174 having coolant passages174A rests above the ceiling. A torus 175 holds the cooling plate 174above the chamber ceiling 152. Plural axial holes 175A extend throughthe torus 175 for mounting the heaters or lamps 172. The ceilingtemperature is sensed by a thermocouple 176. For good thermal contact, athermally conductive material 173 is placed between the torus 175 andthe chamber ceiling 152, and between the torus 175 and the cold plate174.

Radiant heaters 177 such as tungsten halogen lamps are positioned belowthe disposable ring 162 to heat the ring through a window 178. Thetemperature of the ring 162 is controlled using a temperature sensor 179that may extend into a hole 162A in the ring 162.

Plasma confinement magnets 180, 182 are provided adjacent to the annularopening 158 to prevent or reduce plasma flow into the pumping annulus160. The replaceable liner 160A is preferably cooled to a temperaturethat collects any active monomer or specie that enters the annulus 160.A wafer slit 184 in a wall of the pumping annulus 160 accommodates waferingress and egress.

The etching process of the present invention provides high etch ratesand highly selective etching of the dielectric layers on the substrate.The process gas used in the etching process comprises (i) fluorocarbongas for etching the dielectric layer and forming passivating deposits onthe substrate, (ii) carbon-oxygen gas for reducing formation ofpassivating deposits, and (iii) argon or nitrogen-containing gas forremoving the passivating deposits on the substrate. The nature of thesegases and preferred volumetric flow ratios of the gases will now bedescribed.

The fluorocarbon gas is capable of forming fluorine-containing speciesthat etch the dielectric layer on the substrate. For example, a silicondioxide layer is etched by fluorine containing ions and neutrals to formvolatile SiF_(x) species that are exhausted from the processing chamber140. Suitable fluorocarbon gases include carbon, fluorine, andoptionally hydrogen, such as for example, CF₃, CF₄, CH₃F, CHF₃, CH₂F₂,C₂H₄F₆, C₂F₈, C₂HF₅, and C₄F₁₀. It is believed, in general, the absenceof hydrogen in the process gas provide increased amounts of free carbonand CF₂ radicals that result in anisotropic etching and increasedetching selectivity. Preferred gases include CF₄, C₂F₆, and C₄F₈.

The carbon:oxygen gas is used to provide etch selectivity when desiredby controlling formation and removal of carbon-containing species thatform passivating deposits on the substrate. In addition, thecarbon:oxygen gas enhances the formation of free oxygen species thatreact with other species to reduce the formation of polymers thatdeposit on the surfaces of the etched features as passivating deposits.For example, CF₂ radicals polymerize to form polymers that deposits onthe sidewalls of the freshly etched features as a passivating depositthat improves vertical anisotropic etching. For these reasons, the flowrate of carbon-oxygen gas is substantially reduced or eliminated toprovide sufficient fluorine-containing species to rapidly etch thedielectric layers while providing high dielectric to underlayer etchingselectivity, and anisotropic etching. Suitable carbon:oxygen gasesinclude for example, CO, HCOOH, HCHO, and CO₂ of which CO is preferred.Oxygen may also be added to assist in removing excessive passivatingdeposits that form on the sidewalls of vias and trenches.

It is believed the oxygen containing gases react with some of the CF₂radicals to form volatile radicals which are exhausted from theprocessing chamber 140. A resultant increase in oxygen species at thesurface of the specie or in the plasma zone reacts with free carbon toreduce the amount of passivating deposits formed on the substrate, andprevent deposition of excessively thick passivating deposit layers thatcan stop the etching process.

For selective etching, the volumetric flow ratio offluorocarbon/carbon:oxygen gases is selected so the rate of formation ofpassivating deposits on the surfaces of the freshly etched features isdifferent for the different low k dielectric materials. For thedielectric material having the faster etch rate, the rate of formationof passivating deposits is approximately equal to the rate of removal ofthe passivating deposits. For the low dielectric material having theslower etch rate, the rate of formation of passivating deposits exceedsthe rate of removal of the passivating deposits. This provides highetching selectivity ratios, for example, an etching selectivity ratio ofat least about 3:1, while simultaneously etching the dielectric layer ata high etch rate of at least about 400 nm/min, and more typically from600 to 900 nm/min, with reduced etch rate microloading. When thesubstrate comprises an underlayer of material below the dielectriclayer, such as silicon nitride or silicon carbide, the volumetric flowratio of fluorocarbon/carbon:oxygen gas can be tailored to increaseetching selectivity ratios for specific combinations of materials, suchas for example, the etching selectivity of etching dielectric to resist,diffusion barrier layers, or anti-reflective layers. The volumetric flowratio of fluorocarbon/carbon:oxygen containing gas can also be adjustedso that the sidewalls of the etched features have smooth surfaces thatform angles of at least about 87 degrees with the surface of thedielectric layer on the substrate. The volumetric flow ratios can betailored for different combinations of materials, and feature geometry,such as feature aspect ratios, to achieve specific etchingselectivities, etch rate microloading, or etch rates without deviatingfrom the scope of the present invention.

Preferably, inert gas is added to the process gas to form ionizedsputtering species that sputter-off the passivating deposits on thesidewalls of the freshly etched features. The inert gas also ionizes toform ionized metastable states that enhance dissociation of the processgas. Thus, it is also desirable for the inert gas to have a wide rangeof excitation energies, so that energy transfer reactions which promotedissociation of the process gas can occur between the excited inert gasand the process gas. Suitable inert gases include argon, helium, neon,xenon, and krypton, of which argon is preferred. Sufficient inert gas isadded to the process gas to assist in sputtering the passivatingdeposits off the substrate, and to enhance disassociation of the processgas. However, excessive flow of inert gas causes excessive sputtering ofthe resist on the substrate, resulting in resist faceting, etching ofthe dielectric layer underlying the resist, and high profilemicroloading.

Preferred compositions of process gases, suitable for etching carboncontaining silicon oxide layers, comprise a mixture of gases includingargon, CO, and one or more gases selected from CF₄, C₂F₆, and C₄F₈. Forthe volume of the processing chamber described herein, (i) a suitableflow rate of CF₄ is from about 0 to about 80 sccm, and more preferablyfrom about 20 to about 60 sccm; (ii) a suitable flow rate of C₄F₈ isfrom about 0 to about 40 sccm, and more preferably from about 5 to about30 sccm; (iii) a suitable flow rate of CO is from about 0 to about 200sccm, and more preferably from about 20 to about 150 sccm; and (iv) asuitable flow rate of argon is from about 50 to about 400 sccm, and morepreferably from about 100 to about 300 sccm. Because actual flow ratesare dependent upon the volume of the chamber 140, the invention shouldnot be limited to the flow rates recited herein.

For etching of vertical interconnects in the preferred dielectric layerson an 8 inch substrate, the etch gases preferably comprise from about 10sccm to about 80 sccm of one or more fluorocarbon gases and from about100 sccm to about 200 sccm of a carbon:oxygen gas. During etching of thevertical interconnects, a mixture of fluorocarbon gases is preferred sothat passivating deposits can be controlled by varying the relativeamounts of specific fluorocarbon gases in addition to varying therelative amounts of the fluorocarbon gases and carbon:oxygen gases. Apreferred carrier gas is from about 100 sccm to about 300 sccm of argon.

For etching of horizontal interconnects in the preferred dielectriclayers on an 8 inch substrate, the etch gases preferably comprise fromabout 5 sccm to about 80 sccm of one or more fluorocarbon gases and lessthan about 5 sccm of a carbon:oxygen gas. During etching of thehorizontal interconnects, a mixture of fluorocarbon gases can also beused to control passivating although passivating deposits are readilycontrolled by adjusting the flowrate of the fluorocarbon gases. Apreferred carrier gas is from about 100 sccm to about 300 sccm of argon.

The etching process of the present invention provides non-selective orselective etching of dielectric layers containing carbon withoutsacrificing etch rate microloading and dielectric etching rates. Byetching selectivity ratio, it is meant the ratio of the rate of etchingof the dielectric layer to the rate of etching of adjacent layers ofother materials, that include the underlying anti-reflective, diffusionbarrier, silicon nitride, or silicon carbide, and overlying resistlayers. The combination of the high etch rates, low microloading, andhigh etching selectivity is obtained by balancing the rate of depositionand removal of passivation species from the substrate, and bycontrolling the amount of fluorine-containing species available foretching the dielectric layer. While excessive passivating depositsreduce overall dielectric etch rates and increase etch ratemicroloading, suppression of the deposition or formation of polymertypically reduces etching selectivity.

The invention is further described by the following examples which arenot intended to limit the scope of the claimed invention.

EXAMPLE 1

A first oxidized methylsilane layer is deposited on an 8 inch siliconsubstrate placed in a DxZ chamber, available from Applied Materials,Inc., at a chamber pressure of 3.0 Torr and temperature of 15° C. fromreactive gases which are flowed into the reactor as follows:

Methylsilane, CH₃—SiH₃, at 34 sccm Nitrous oxide, N₂O, at 360 sccmHelium, He, at 2000 sccm.

The substrate is positioned 320 mil from the gas distribution showerheadand 300 W of high frequency RF power (13 MHz) is applied to theshowerhead for plasma enhanced deposition of a first oxidizedmethylsilane layer containing about 5% carbon by atomic weight and about0.3% hydrogen by atomic weight, the first layer having a thickness of atleast 5,000 Å. Then the flow of methylsilane is increased to 68 sccm anda second oxidized methylsilane layer containing about 10.5% carbon byatomic weight and about 3% hydrogen by atomic weight is deposited at apower level of 80 W, the second layer having a thickness of at least1000 Å. Then the flow of methysilane is decreased to 34 sccm anddeposition of a third oxidized methylsilane layer containing about 5%carbon and 0.3% hydrogen is deposited at a power level of 300 W, thelayer having a thickness of at least 5000 Å. The deposited dielectriclayers are then cured at 400° C. to remove remaining moisture and thesubstrate is transferred for etching of a dual damascene structure.

In a conventional photolithographic process, a photoresist, such as“RISTON,” manufactured by duPont de Nemours Chemical Company, is appliedon the third oxidized methylsilane layer to a thickness of about 0.4 toabout 1.3 micron, and the vias to be etched in the dielectric layers aredefined by exposing the resist to a pattern of light through a mask thatcorresponds to the desired configuration of features. The dielectriclayers below the unexposed portions of the resist are etched in an IPSETCH chamber, available from Applied Materials Inc., using the followingamounts of process gases:

C₄F₈, at 20 sccm CF₄, at 40 sccm CO, at 150 sccm Argon Ar, at 250 sccm.

The patterned substrate was placed on the cathode pedestal of the etchchamber, and the chamber was maintained at a pressure of about 30 mTorr.A plasma was generated by applying a RF voltage to the dual solenoidcoil at a power level of about 2000 Watts. A bias power of 1000 Wattswas applied to the cathode pedestal. The substrate was cooled or heatedto −10° C. using a flow of backside helium to maintain a thin layer ofpassivating deposits on the sidewalls of freshly etched features. Theetching process was performed for a sufficient time to etch vias in thethird oxidized methylsilane layer. Then etching of the via continuedthrough the second oxidized methylsilane layer at 30 mTorr with thefollowing gas flows:

C₄F₈, at 0 sccm CF₄, at 60 sccm CO, at 150 sccm Argon Ar, at 250 sccm.

The etching process was performed for a sufficient time to etch throughthe second oxidized methylsilane layer. Then etching continued throughthe first oxidized methysilane layer at 30 mTorr with the following gasflows:

C₄F₈, at 20 sccm CF₄, at 40 sccm CO, at 150 sccm Argon Ar, at 250 sccm.

The etching process was performed for a sufficient time to etch throughthe first oxidized methysilane layer. Then over-etching was performedwith the following changes in flow rates:

C₄F₈, at 20 sccm CF₄, at 40 sccm CO, at 100 sccm Argon Ar; at 250 sccm.

The overetching process was performed at a dual solenoid power level of1600 W and a cathode pedestal power level of 1000 W for a sufficienttime to complete all vias through the first oxidized methysilane layer.

SEM photos of the etched wafers were used to measure (i) the dielectricetch rate, (ii) the etching selectivity ratio of the dielectric etchingto photoresist etching, (iii) etch rate uniformity, and (iv) the % etchrate microloading. Results are shown below for the via etch steps. Etchrates were calculated by measuring the depth of the features etched inthe substrates. The etching selectivity ratio was calculated from theratio of the etch rate of the dielectric layers 20 to the etch rate ofthe photoresist layer. The etch rate uniformity was calculated using atleast 15 different measured points. The % etch rate microloading is ameasure of the difference in etch rates obtained when etching featureshaving different sizes on the substrates. In the examples below, percentetch rate microloading was measured for large holes having diameters ofabout 0.5 microns and small holes having diameters of about 0.25microns, the etch rates being averaged for the center and peripheraledge of the substrates.

The old photoresist is then stripped by an oxygen plasma and aphotoresist is re-applied and patterned to define horizontalinterconnects such as trenches. The dielectric layer below the unexposedportions of the resist are selectively etched down to the etch stoplayer in the IPS ETCH chamber, using the following amounts of processgases at a chamber pressure of 7 mTorr:

C₄F₈, at 19 sccm CF₄, at 0 sccm CO, at 0 sccm Argon Ar, at 100 sccm.

A plasma was generated by applying a RF voltage to the dual solenoidcoils having a power level of about 1400 Watts. The cathode pedestalpower level was set at 1500 Watts. The substrate was cooled or heated to+10° C. using a flow of backside helium to maintain a thin layer ofpassivating deposits on the sidewalls of freshly etched features. Theetching process was performed for a sufficient time to etch all trenchesthrough the third oxidized methylsilane layer.

As an alternative, etching of the trenches could start at a higherpressure such as 20 mTorr by increasing gas flows about 50% andincreasing power to the solenoid coils by about 1000 W, then etchconditions could be altered to a lower pressure such as 7 mTorr for lessaggressive etching of the trench to ensure stopping on the secondoxidized methysilane layer.

SEM photos of the etched wafers were again used to measure the etchperformance and results are shown below for each of the etch steps.

TABLE 2 Etch Performance for Example 1 Via-1st Via 2nd Via-3rd OE TrenchEtch Rate, Å/min 750 1,200 750 1,700 2,400 Selectivity 3:1 3.5:1 3:13.5:1 1.2: Uniformity ±10% ±5% ±10% ±5% ±5% μ-loading −% 10% −% 10% 15%

EXAMPLE 2

The preceding example deposits the dielectric layers in a single chamberby varying only the flow of the silicon compound and the power level.This example modifies the first example by replacing methylsilane withTEOS for the first dielectric layer as follows.

A first oxidized TEOS layer is deposited on an 8 inch silicon substrateplaced in a DxZ chamber, available from Applied Materials, Inc., at achamber pressure of 3.0 Torr and temperature of 350° C. from reactivegases which are flowed into the reactor as follows:

TEOS, (CH₃—CH₂—O—)₄—Si, at 40 sccm Oxygen, O₂, at 360 sccm Helium, He,at 2000 sccm.

The substrate is positioned 320 mil from the gas distribution showerheadand 750 W of high frequency RF power (13 MHz) is applied to theshowerhead for plasma enhanced deposition of a silicon oxide layercontaining less than 1% carbon by atomic weight and less than 0.1%hydrogen by atomic weight, the layer having a thickness of at least 5000Å. Then deposition of second and third dielectric layers then continuesusing methysilane as described for Example 1.

Etching of a dual damascene structure is performed as described inExample 1 except that the etch conditions for forming verticalinterconnects in the deposited TEOS layer and for an overetch of thevertical interconnects are as follows:

C₄F₈, at 15 sccm C₂F₆, at 20 sccm CO, at 0 sccm Argon Ar, at 350 sccm.

During etching of the lower silicon oxide layer and the over-etching ofthe vertical interconnects, a plasma is generated by applying 2200 W ofRF power to the dual solenoid coils and 1400 W of RF power to the biaselectrode. The substrate is cooled or heated to −10° C. using a flow ofbackside helium to maintain a thin layer of passivating deposits on thesidewalls of freshly etched features.

While the foregoing is directed to preferred embodiments of the presentinvention, other and further embodiments of the invention may be devisedwithout departing from the basic scope thereof, and the scope thereof isdetermined by the claims which follow.

What is claimed is:
 1. A process for depositing and etching intermetaldielectric layers, comprising: depositing a first dielectric layerhaving a dielectric constant less than about 4.0; depositing a seconddielectric layer having a dielectric constant less than about 4.0 on thefirst dielectric layer; and etching the second dielectric layer underconditions wherein the second dielectric layer has an etch rate that isat least about three times greater than an etch rate for the firstdielectric layer.
 2. The process of claim 1, wherein the firstdielectric layer comprises silicon, oxygen, and at least about 5% carbonby atomic weight, and the second dielectric layer comprises silicon,oxygen, and less than about two-thirds of the carbon contained in thefirst dielectric layer.
 3. The process of claim 2, wherein the firstdielectric layer is etched to form vertical interconnects with a firstgas mixture comprising one or more fluorocarbon compounds and one ormore carbon:oxygen compounds, and the second dielectric layer is etchedto form horizontal interconnects with a second gas mixture comprisingone or more fluorocarbon compounds and essentially no carbon:oxygencompounds.
 4. The process of claim 3, wherein the carbon:oxygen compoundis carbon monoxide.
 5. The process of claim 1, wherein the firstdielectric layer comprises silicon, oxygen, carbon, and at least 1%hydrogen by atomic weight, and the second dielectric layer comprisessilicon, oxygen, carbon, and less than one-fifth of the hydrogencontained in the first dielectric layer.
 6. The process of claim 5,wherein the first dielectric layer is etched to form verticalinterconnects with a first gas mixture comprising one or morefluorocarbon compounds and one or more carbon:oxygen compounds, and thesecond dielectric layer is etched to form horizontal interconnects witha second gas mixture comprising one or more fluorocarbon compounds andessentially no carbon:oxygen compounds.
 7. The process of claim 6,wherein the carbon:oxygen compound is carbon monoxide.
 8. The process ofclaim 1, wherein the first and second dielectric layers are deposited byoxidizing an organosilicon compound.
 9. The process of claim 8, whereinthe organosilicon compound is methylsilane or trimethylsiloxane.
 10. Theprocess of claim 1, wherein the first dielectric layer is deposited on athird dielectric layer having a dielectric constant less than about 4.0.11. A process for depositing low dielectric constant layers, comprising:varying one or more process conditions for depositing an organosiliconcompound to obtain first and second dielectric layers having varyingsilicon, oxygen, carbon, and hydrogen contents and dielectric constantsless than about 4; and etching the second dielectric layer usingconditions wherein the second dielectric layer has an etch rate that isat least 3 times greater than an etch rate for the first dielectriclayer.
 12. The process of claim 11, wherein the first dielectric layercontains at least 5% carbon by atomic weight or at least 1% hydrogen byatomic weight, and wherein the second dielectric layer contains lessthan two-thirds of the carbon in the first silicon oxide layer or lessthan one-fifth of the hydrogen in the first silicon oxide layer.
 13. Theprocess of claim 12 wherein the second dielectric layer is etched toform horizontal interconnects with a first gas mixture comprising one ormore fluorocarbons and essentially no carbon:oxygen compounds.
 14. Theprocess of claim 11, wherein the first dielectric layer is deposited ona third dielectric layer having silicon, oxygen, carbon, and hydrogencontents similar to the second dielectric layer.